Complete sample preparation in a
The Model 1030 Automated Sample Preparation (ASaP) System
is a powerful, rapid, and flexible tool that significantly
enhances the image quality and analytical data derived from
scanning electron microscopy (SEM) samples. It combines the features of
- Plasma cleaning (PC)
- Ion beam etching (IBE)
- Reactive ion etching (RIE)
- High-resolution ion beam sputter coating (IBSC).
Plasma cleaning is used to remove organic contamination from
the sample. Ion beam etching (IBE) is used to planarize the
surface by removing surface defects such as smearing and scratching.
Reactive ion etching (RIE) is a chemistry-specific process
that enables the selective etching of sample constituents.
To eliminate the detrimental effects of charging in the SEM,
the Model 1030 ASaP provides high-resolution coating using
ion beam sputter coating (IBSC). An oil-free vacuum system
ensures optimal performance.
The operator may choose any process in any sequence, depending
on the sample requirements. Operation is fully programmable
and automatic, completing sample preparation rapidly enough
for high-throughput applications. Complete process sequences
or recipes can be readily stored and recalled.
Yields optimal information
Advanced field emission scanning electron microscopy (FESEM)
samples in the physical sciences include semiconductor devices,
nanotechnology structures, metal matrix composites, thermal
barrier coatings, and microelectromechanical systems (MEMS)
components. In many cases, features or particle sizes are
on the nanometer or sub-nanometer scale. Since FESEM yields
resolution to one nanometer at accelerating voltages of 1kV
or less, a high level of importance is placed on the sample’s
surface characteristics. The Model 1030 is highly effective
in optimizing the information obtained from the sample.