Featured Product
- Selected-area milling on full 300 mm wafers
- Top-down delayering
- Expose multiple device layers and structures
- For use in multiple areas of a semiconductor fabrication facility:
– Research and development
– Process control
– Yield enhancement
– Failure analysis
CD-SEM specimen preparation
Featured Application
Providing problem-solving tools
Industrial applications for electron microscopy are certainly varied. At the surface, it is not...